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There are two photolithography systems: one with light source of wavelength $\lambda _{1}=156\:nm$ (System $1$) and another with light source of wavelength $\lambda _{2}=325\:nm$ (System $2$). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using system$1$ and system$2$ are $L_{min1}$ and $L_{min2}$  respectively, the ratio $L_{min1}/L_{min2}$ (correct to two decimal places) is __________.