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The source of a silicon ($n_i=10^{10}\:per\:cm^3$) n-channel MOS transistor has an area of $1\:sq\:\mu m$ and a depth of $1\:\mu m$. If the dopant density in the source is $10^{19}/cm^3$, the number of holes in the source region with the above volume is approximately

  1. $10^7$
  2. $100$
  3. $10$
  4. $0$
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