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GATE ECE 2014 Set 2 | Question: 10
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In CMOS technology, shallow P-well or N-well regions can be formed using
low pressure chemical vapour deposition
low energy sputtering
low temperature dry oxidation
low energy ion-implantation
gate2014-ec-2
electronic-devices
cmos
asked
Mar 26, 2018
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Electronic Devices
by
Milicevic3306
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Nov 15, 2020
by
soujanyareddy13
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