0 votes 0 votes In CMOS technology, shallow P-well or N-well regions can be formed using low pressure chemical vapour deposition low energy sputtering low temperature dry oxidation low energy ion-implantation Electronic Devices gate2014-ec-2 electronic-devices cmos + – Milicevic3306 asked Mar 26, 2018 • recategorized Nov 15, 2020 by soujanyareddy13 Milicevic3306 16.0k points 83 views answer comment Share Follow See all 0 reply Please log in or register to add a comment.