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Recent questions tagged photolithography
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GATE ECE 2018 | Question: 20
There are two photolithography systems: one with light source of wavelength $\lambda _{1}=156\:nm$ (System $1$) and another with light source of wavelength $\lambda _{2}=325\:nm$ (System $2$). Both photolithography systems are otherwise identical. If ... $L_{min2}$ respectively, the ratio $L_{min1}/L_{min2}$ (correct to two decimal places) is __________.
There are two photolithography systems: one with light source of wavelength $\lambda _{1}=156\:nm$ (System $1$) and another with light source of wavelength $\lambda _{2}=...
gatecse
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Feb 19, 2018
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