Which of the following is true?
- A silicon wafer heavily doped with boron is a $p^{+}$substrate
- A silicon wafer lightly doped with boron is a $p^{+}$ substrate
- A silicon wafer heavily doped with arsenic is a $\mathrm{p}^{+}$substrate
- A silicon wafer lightly doped with arsenic is a $p^{+}$ substrate